Supercritical metalens at h-line for high-resolution direct laser writing-Reference-Cited by-同舟云学术

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Supercritical metalens at h-line for high-resolution direct laser writing

Published:2024 Issue:0 Volume:0 Page:230035-230035
ISSN:2097-0382
Container-title:Opto-Electronic Science
language:
Short-container-title:OES

Author:

Fu Jichao, ,Jiang Mengting,Wang Zeng,Chen Yi Fan,Liu Yuanda,Wu Qing Yang Steve,Sim Ai Jia,Wang Jiang,Chen Mingxi,Wang Ziyu,Deng Jie,Tang Xiao Song Eric,Huang Kun,Liu Hong,Teng Jinghua, ,

Publisher

Opto-Electronic Advances

Reference47 articles.

Fischer J, Wegener M. Three-dimensional optical laser lithography beyond the diffraction limit. Laser Photonics Rev 7, 22–44 (2013).

Smith HI. A review of submicron lithography. Superlattices Microstruct 2, 129–142 (1986).

Ito T, Okazaki S. Pushing the limits of lithography. Nature 406, 1027–1031 (2000).

Kneer B, Migura S, Kaiser W et al. EUV lithography optics for sub-9nm resolution. Proc SPIE 9422, 94221G (2015).

Zahlten C, Gräupner P, van Schoot J et al. High-NA EUV lithography: pushing the limits. Proc SPIE 11177, 111770B (2019).

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