Author:
Imas Jose Javier, ,Matías Ignacio R.,Del Villar Ignacio,Ozcáriz Aritz,Zamarreño Carlos Ruiz,Albert Jacques, ,
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference35 articles.
1.
Ohring M. Chapter 10 - Characterization of thin films and surfaces. In Ohring M. Materials Science of Thin Films 2nd ed (Academic Press, San Diego, 2002);http://doi.org/10.1016/B978-012524975-1/50013-6.
2.
Podraza NJ, Jellison GE Jr. Ellipsometry. In Lindon JC, Tranter GE, Koppenaal DW. Encyclopedia of Spectroscopy and Spectrometry 3rd ed 482–489 (Academic Press, Oxford, 2017);http://doi.org/10.1016/B978-0-12-409547-2.10991-6.
3. Garcia-Caurel E, De Martino A, Gaston JP, Yan L. Application of spectroscopic ellipsometry and mueller ellipsometry to optical characterization. Appl Spectrosc 67, 1–21 (2013).
4. McCrackin FL, Passaglia E, Stromberg RR, Steinberg HL. Measurement of the thickness and refractive index of very thin films and the optical properties of surfaces by ellipsometry. J Res Natl Bur Stand A Phys Chem 67A, 363–377 (1963).
5. Wei JS, Westwood WD. A new method for determining thin‐film refractive index and thickness using guided optical waves. Appl Phys Lett 32, 819–821 (1978).
Cited by
5 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献