Process variation aware OPC with variational lithography modeling

Author:

Yu Peng,Shi Sean X.,Pan David Z.

Publisher

ACM Press

Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Machine Learning for Mask Synthesis and Verification;Machine Learning Applications in Electronic Design Automation;2022

2. A Workflow of Hotspot Prediction based on Semi-Supervised Machine Learning Methodology;2021 International Workshop on Advanced Patterning Solutions (IWAPS);2021-12-12

3. Optical Proximity Correction (OPC) Under Immersion Lithography;Micro/Nanolithography - A Heuristic Aspect on the Enduring Technology;2018-05-02

4. Manufacturing Solutions;Dependable Multicore Architectures at Nanoscale;2017-08-30

5. A Fast Mask Manufacturability and Process Variation Aware OPC Algorithm with Exploiting a Novel Intensity Estimation Model;IEICE Transactions on Fundamentals of Electronics, Communications and Computer Sciences;2016

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