Author:
Yu Peng,Shi Sean X.,Pan David Z.
Cited by
9 articles.
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1. Machine Learning for Mask Synthesis and Verification;Machine Learning Applications in Electronic Design Automation;2022
2. A Workflow of Hotspot Prediction based on Semi-Supervised Machine Learning Methodology;2021 International Workshop on Advanced Patterning Solutions (IWAPS);2021-12-12
3. Optical Proximity Correction (OPC) Under Immersion Lithography;Micro/Nanolithography - A Heuristic Aspect on the Enduring Technology;2018-05-02
4. Manufacturing Solutions;Dependable Multicore Architectures at Nanoscale;2017-08-30
5. A Fast Mask Manufacturability and Process Variation Aware OPC Algorithm with Exploiting a Novel Intensity Estimation Model;IEICE Transactions on Fundamentals of Electronics, Communications and Computer Sciences;2016