Optical Proximity Correction (OPC) Under Immersion Lithography

Author:

Awad Ahmed,Takahashi Atsushi,Kodaman Chikaaki

Publisher

InTech

Reference38 articles.

1. Xu M, Arce G. Computational Lithography. Wiley Publisher; 2010

2. Mack C, Carback R. Modeling the effects of prebake on positive resist processing. Proceedings of Kodak Microelectronics Seminar Interface. 1985. pp. 155-158

3. International Technology Roadmap for Semiconductors. Technical Report. 2014. http://public.itrs.net

4. Wong B, Mittal A, Starr G, Zach F, Moroz V, Kahng A. Nano-CMOS Design for Manufacturability: Robust Circuit and Physical Design for sub-65nm Technology Nodes. Wiley Publisher; 2008

5. Mack C. Corner rounding and line-end shortening in optical lithography. Proceedings of SPIE. 2000;4226:83-92

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1. Resolution technology of lithography machine;Journal of Physics: Conference Series;2022-05-01

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