A novel layout decomposition algorithm for triple patterning lithography
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ACM Press
Cited by 16 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Scalable layout decomposition implemented by a distribution evolutionary algorithm;Integration;2024-03
2. Layout Decomposition via Boolean Satisfiability;2023 60th ACM/IEEE Design Automation Conference (DAC);2023-07-09
3. A study on flare minimisation in EUV lithography by post‐layout re‐allocation of wire segments;IET Circuits, Devices & Systems;2021-03-29
4. Fixed-Parameter Tractable Algorithms for Optimal Layout Decomposition and Beyond;Proceedings of the 54th Annual Design Automation Conference 2017;2017-06-18
5. Toward Unidirectional Routing Closure in Advanced Technology Nodes;IPSJ Transactions on System LSI Design Methodology;2017
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