Spacer-is-dielectric-compliant detailed routing for self-aligned double patterning lithography

Author:

Du Yuelin,Ma Qiang,Song Hua,Shiely James,Luk-Pat Gerard,Miloslavsky Alexander,Wong Martin D. F.

Publisher

ACM Press

Cited by 10 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Design of Digital Integrated Circuits by Improving the Characteristics of Digital Cells;Machine Learning-based Design and Optimization of High-Speed Circuits;2023-12-31

2. Cut Optimization for Redundant Via Insertion in Self-Aligned Double Patterning;ACM Transactions on Design Automation of Electronic Systems;2019-11-14

3. TritonRoute;Proceedings of the International Conference on Computer-Aided Design;2018-11-05

4. ISPD 2018 Initial Detailed Routing Contest and Benchmarks;Proceedings of the 2018 International Symposium on Physical Design;2018-03-25

5. Concurrent Pin Access Optimization for Unidirectional Routing;Proceedings of the 54th Annual Design Automation Conference 2017;2017-06-18

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