Mask assignment and synthesis of DSA-MP hybrid lithography for sub-7nm contacts/vias
Author:
Affiliation:
1. University of California, Los Angeles
2. Mentor Graphics Corporation
Funder
IMPACT+ (impact.ee.ucla.edu)
Publisher
ACM
Link
https://dl.acm.org/doi/pdf/10.1145/2744769.2744868
Reference18 articles.
1. http://www.opencores.org. http://www.opencores.org.
2. SRAM, NAND, DRAM contact hole patterning using block copolymer directed self-assembly guided by small topographical templates
3. Polymer self assembly in semiconductor microelectronics
4. Experimental demonstration of aperiodic patterns of directed self-assembly by block copolymer lithography for random logic circuit layout
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