Cutting structure-aware analog placement based on self-aligned double patterning with e-beam lithography-Reference-Cited by-同舟云学术

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Cutting structure-aware analog placement based on self-aligned double patterning with e-beam lithography

Published:2015-06-07 Issue: Volume: Page:
ISSN:
Container-title:Proceedings of the 52nd Annual Design Automation Conference
language:
Short-container-title:

Author:

Ou Hung-Chih¹,Tseng Kai-Han¹,Chang Yao-Wen¹

Affiliation:

1. National Taiwan University, Taipei, Taiwan

Funder

National Science Council Taiwan

Academia Sinica

Ministry of Science and Technology, Taiwan

Taiwan Semiconductor Manufacturing Company

MediaTek

Genesys Logic

SpringSoft

International Business Machines Corporation

Publisher

ACM

Link

https://dl.acm.org/doi/pdf/10.1145/2744769.2744813

Reference19 articles.

1. Double patterning lithography-aware analog placement

2. Throughput Optimization for SADP and E-beam based Manufacturing of 1D Layout

3. Graph-Based Subfield Scheduling for Electron-Beam Photomask Fabrication

4. Flexible self-aligned double patterning aware detailed routing with prescribed layout planning

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