Author:
Ding Yixiao,Chu Chris,Mak Wai-Kei
Cited by
9 articles.
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1. Challenges and Research Directions;Split Manufacturing of Integrated Circuits for Hardware Security and Trust;2021
2. Cut Optimization for Redundant Via Insertion in Self-Aligned Double Patterning;ACM Transactions on Design Automation of Electronic Systems;2019-11-14
3. Two-Stage Layout Decomposition for Hybrid E-Beam and Triple Patterning Lithography;ACM Transactions on Design Automation of Electronic Systems;2017-10-17
4. DSA-compliant routing for two-dimensional patterns using block copolymer lithography;Proceedings of the 35th International Conference on Computer-Aided Design;2016-11-07
5. Incorporating cut redistribution with mask assignment to enable 1D gridded design;Proceedings of the 35th International Conference on Computer-Aided Design;2016-11-07