Adhesion Enhancement of Norbornene Polymers with Lithocholate Substituents for 193-nm Resists
Author:
Publisher
Springer Science and Business Media LLC
Subject
Materials Chemistry,Polymers and Plastics
Reference11 articles.
1. Chemical amplification mechanisms for microlithography
2. Thermolysis and photochemical acidolysis of selected polymethacrylates
3. 193-nm Photoresists Based on Norbornene Copolymers with Derivatives of Bile Acid
4. Adhesion-promoted copolymers based on norbornene derivatives and maleic anhydride for 193-nm photoresists
5. Chemically Amplified Resist Based on High Etch-Resistant Polymers for 193-nm Lithography.
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