Monte Carlo Study of the Influence of Electron Beam Focusing to SEM Image Sharpness Measurement-Reference-Cited by-同舟云学术

Monte Carlo Study of the Influence of Electron Beam Focusing to SEM Image Sharpness Measurement

Published:2014 Issue:0 Volume:12 Page:247-251
ISSN:1348-0391
Container-title:e-Journal of Surface Science and Nanotechnology
language:en
Short-container-title:e-J. Surf. Sci. Nanotechnol.

Author:

Ruan Z.¹,Zhang P.¹,Mao S. F.²,Li H. M.³,Ding Z. J.¹

Affiliation:

1. Hefei National Laboratory for Physical Sciences at Microscale and Department of Physics, University of Science and Technology of China

2. School of Nuclear Science and Technology, University of Science and Technology of China

3. Supercomputing Center, University of Science and Technology of China

Publisher

Surface Science Society Japan

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Mechanics of Materials,Condensed Matter Physics,Bioengineering,Biotechnology

Link

https://www.jstage.jst.go.jp/article/ejssnt/12/0/12_247/_pdf

Reference28 articles.

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3. [3] N. F. Zhang, M. T. Postek, R. D. Larrabee, A. E. Vladar, W. J. Kerry, and S. N. Jones, Scanning 21, 246 (1999).

4. [4] N. F. Zhang, A. E. Vladar, M. T. Postek, and R. D. Larrabee, Metrologia 42, 351 (2005).

5. [5] N. F. Zhang, A. E. Vladar, M. T. Postek, and R. D. Larrabee, Proc. Section of Physical and Engineering Sciences of American Statistical Soc., 4730 (2003).

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