Ultra-Trace-Element Analysis Used with Total-Renection X-ray Photoelectron Spectroscopy.
Author:
Affiliation:
1. Application and Research Center, Electron Optics Division, JEOL Ltd.
2. Micro-fabrication Process Development Goup, ULSI Device Development Laboratories, NEC Co.
Publisher
Surface Science Society Japan
Subject
General Earth and Planetary Sciences,General Engineering,General Environmental Science
Link
http://www.jstage.jst.go.jp/article/jsssj/21/6/21_6_367/_pdf
Reference30 articles.
1. Ultrasoft-X-Ray Reflection, Refraction, and Production of Photoelectrons (100-1000-eV Region)
2. Angular-dependent X-ray photoemission study of oxidized silicon at low X-ray incidence angles
3. Grazing-incidence x-ray photoelectron spectroscopy from multilayer media: Oxidized GaAs(100) as a case study
4. Grazing-incidence x-ray photoemission spectroscopy investigation of oxidized GaAs(100): A novel approach to nondestructive depth profiling
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