Silicon and Silicon-dioxide Processing for High-frequency MESFET Preparation
-
Published:1970-03
Issue:2
Volume:14
Page:142-147
-
ISSN:0018-8646
-
Container-title:IBM Journal of Research and Development
-
language:
-
Short-container-title:IBM J. Res. & Dev.
Subject
General Computer Science
Cited by
13 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. JFETs and MESFETs — Field Effect Transistors;Semiconductor Devices and Integrated Electronics;1980
2. The use of a four-point probe for profiling sub-micron layers;Solid-State Electronics;1978-09
3. Submicrometer Self-Aligued GaAs MESFET (Short Papers);IEEE Transactions on Microwave Theory and Techniques;1976-06
4. Dielectric Thin Films;Semiconducting Devices;1976
5. Schottky Diodes;Semiconducting Devices;1976