The use of a four-point probe for profiling sub-micron layers
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference12 articles.
1. Silicon and Silicon-dioxide Processing for High-frequency MESFET Preparation
2. High-Dose Implantations of P, As, and Sb in Silicon: A Comparison of Room-Temperature Implantations Followed by a 550°C Anneal and Implantations Conducted at 600°C
3. Ion Implantation;Dearnaley,1973
4. Current spreading at contacts to planar Gunn devices
5. Electrode Reactions and Mechanism of Silicon Anodization in N-Methylacetamide
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5. Investigation of high concentration effects of Sb and P in silicon by combination of SIMS and TEM;Fresenius' Zeitschrift für analytische Chemie;1989-01
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