Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuits-Reference-Cited by-同舟云学术

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Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuits

Published:1999-01 Issue:1.2 Volume:43 Page:5-38
ISSN:0018-8646
Container-title:IBM Journal of Research and Development
language:
Short-container-title:IBM J. Res. & Dev.

Author:

Cote D. R.,Nguyen S. V.,Stamper A. K.,Armbrust D. S.,Tobben D.,Conti R. A.,Lee G. Y.

Publisher

IBM

Subject

General Computer Science

Link

http://xplorestaging.ieee.org/ielx5/5288520/5389250/05389252.pdf?arnumber=5389252

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