A Study of Positron Properties in Quartz Crystals and Synthetic Silica Glass-Reference-Cited by-同舟云学术

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A Study of Positron Properties in Quartz Crystals and Synthetic Silica Glass

Published:2001-03 Issue:3-4 Volume:99 Page:321-328
ISSN:0587-4246
Container-title:Acta Physica Polonica A
language:en
Short-container-title:Acta Phys. Pol. A

Author:

Anwand W.¹,Brauer G.¹,Hasegawa M.²,Dersch O.³,Rauch F.³

Affiliation:

1. Institut für Ionenstrahlphysik und Materialforschung, Forschungszentrum Rossendorf, Postfach 51 01 19, 01314 Dresden, Germany

2. Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan

3. Institut für Kernphysik, Universität Frankfurt, August-Euler-Str. 6, 60486 Frankfurt/Main, Germany

Publisher

Institute of Physics, Polish Academy of Sciences

Subject

General Physics and Astronomy

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Structural Characterisation of Er Implanted, Ge-Rich SiO₂ Layers Using Slow Positron Implantation Spectroscopy;Materials Science Forum;2010-12

2. Structural Changes in Flash Lamp Annealed Amorphous Si Layers Probed by Slow Positron Implantation Spectroscopy;Acta Physica Polonica A;2008-05

3. Further indication of a low quartz structure at the SiO2/Si interface from coincidence Doppler broadening spectroscopy;Applied Surface Science;2006-02

4. Positron-annihilation monitoring of reduction processes in conducting glasses;Journal of Alloys and Compounds;2004-11

5. Characterization of theSiO2/Siinterface by positron annihilation spectroscopy;Physical Review B;2002-11-27

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