Characterization of TiAlV Films Prepared by Vacuum Arc Deposition: Effect of Substrate Temperature-Reference-Cited by-同舟云学术

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Characterization of TiAlV Films Prepared by Vacuum Arc Deposition: Effect of Substrate Temperature

Published:2013 Issue:1 Volume:123 Page:76
ISSN:0587-4246
Container-title:Acta Physica Polonica A
language:en
Short-container-title:Acta Phys. Pol. A

Author:

Abdallah B.,Mrad O.,Ismail I.M.

Publisher

Institute of Physics, Polish Academy of Sciences

Subject

General Physics and Astronomy

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Characterization of aluminum nitride thin films by ion beam analysis techniques;Applied Radiation and Isotopes;2024-04

2. Study of morphological, physical and mechanical properties of thin NbN films synthesized via DC magnetron sputtering system;World Journal of Engineering;2023-05-18

3. Effect of sputtering power on microstructure and corrosion properties of TiO2 films deposited by reactive magnetron sputtering;Journal of Materials Research and Technology;2022-07

4. Morphology and Corrosion Behavior Study of Thin TiN Films Deposited at Different Substrates by DC Magnetron Sputtering;Orbital: The Electronic Journal of Chemistry;2021-03-30

5. DEPOSITION OF TiAlV THIN FILMS BY PULSED LASER AND DC MAGNETRON SPUTTERING: STRUCTURAL, COMPOSITIONAL AND ELECTROCHEMICAL CORROSION STUDY;Surface Review and Letters;2019-12-17

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