New Semiconductor Devices
Author:
Affiliation:
1. Sinano Institute, IMEP (CNRS-INPG-UJF), Grenoble INP-Minatec, 3 Parvis Louis Néel, BP 257, 38016 Grenoble cedex 1, France
Publisher
Institute of Physics, Polish Academy of Sciences
Subject
General Physics and Astronomy
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Electrical and chemical characteristics of probe-induced two-dimensional SiOx protrusion layers;Applied Physics Letters;2013-01-21
2. Scanning Photoemission Spectromicroscopic Study of 4-nm Ultrathin SiO3.4 Protrusions Probe-Induced on the Native SiO2 Layer;Microscopy and Microanalysis;2011-10-11
3. Threshold voltage analytic model for strained SiGe-on-insulator p-channel metal-oxide-semiconductor-field-effect-transistor;Acta Physica Sinica;2010
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