Study of Silicon Nanocrystals Formation in Annealed Amorphous In Situ Nitrogen Doped Silicon Thin Films Obtained by Low Pressure Chemical Vapor Deposition-Reference-Cited by-同舟云学术

Study of Silicon Nanocrystals Formation in Annealed Amorphous In Situ Nitrogen Doped Silicon Thin Films Obtained by Low Pressure Chemical Vapor Deposition

Published:2012-01 Issue:1 Volume:121 Page:175-177
ISSN:0587-4246
Container-title:Acta Physica Polonica A
language:en
Short-container-title:Acta Phys. Pol. A

Author:

Bouridah H.¹,Haoues H.¹,Beghoul M.R.¹,Mansour F.²,Remmouche R.¹,Temple-Boyer P.³⁴

Affiliation:

1. Département d'Electronique, Université de Jijel, B.P. 98, Ouled Aissa, Jijel 18000, Algeria

2. Département d'Electronique, Université Mentouri, Route d'Ain El-Bey, Constantine 25000, Algeria

3. CNRS, LAAS, 7 av. du colonel Roche, F-31077 Toulouse, France

4. UPS, INSA, INP, ISAE, LAAS, Université de Toulouse, F-31077 Toulouse, France

Publisher

Institute of Physics, Polish Academy of Sciences

Subject

General Physics and Astronomy

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