Factors affecting the ion-beam thinning characteristics of ceramics
Author:
Publisher
Wiley
Subject
Histology,Pathology and Forensic Medicine
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1111/j.1365-2818.1981.tb02486.x/fullpdf
Reference19 articles.
1. Sputtering-field studies in silicon and silver targets;Anderson;Radiat. Effects,1973
2. Heavy-ion sputtering yield of silicon;Anderson;J. appl. Phys.,1975
3. Determination of bond energy of silica glass by means of ion-sputtering investigations;Bach;Nucl. Instr. Methods,1970
4. Thin foils of non-metals made for electron microscopy by sputter-etching;Barber;J. Mat. Sci.,1970
5. Multiple ion scattering;Boers;Surf. Sci.,1977
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1. Effects of the electric field on the aggregation of point defects in ion-irradiated α-Al 2 O 3;Philosophical Magazine Letters;2003-01
2. Specimen preparation methods;Polymer Microscopy;1996
3. Radiation damage in ion-milled specimens: characteristics, effects and methods of damage limitation;Ultramicroscopy;1993-09
4. Electron microscopy and EDX-microanalysis of photochromic silver halide glasses of the composition systems Al2O3-B2O3-SiO2 and Na2O-CaO-SiO2;Journal of Materials Science;1991-01-01
5. Observations of the influence of ion-bombardment on the microstructure of synthetic and natural ferrite crystals;Journal of Materials Science Letters;1988-06
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