Author:
Todokoro H.,Yoneda S.,Yamaguchi K.,Fukuhara S.,Komoda T.
Subject
Histology,Pathology and Forensic Medicine
Reference8 articles.
1. Process characterization of MOS devices by scanning electron microscopy with 0.5-1 kV electrons;Hashimoto;Japan J. appl. Phys.,1982
2. Electron beam effects on microelectronic devices;Keery;Scanning Electron Microsc.,1976
3. Electron beam test system for VLSI circuit inspection;Menzel;Scanning Electron Microsc.,1979
4. Measurement of deep penetration of low-energy electrons into metal-oxide-semiconductor structure;Nakamae;J. appl. Phys.,1981
5. An analysis of the local field effect on electron probe voltage measurements;Nakamura;Scanning Electron Microsc.,1983
Cited by
17 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献