‘Box‐Profile’ Ion Implants as Geochemical Reference Materials for Electron Probe Microanalysis and Secondary Ion Mass Spectrometry

Author:

Wu Haosheng1,Böttger Roman2,Couffignal Frédéric3,Gutzmer Jens1,Krause Joachim1,Munnik Frans2,Renno Axel D.1,Hübner René2,Wiedenbeck Michael3,Ziegenrücker René2

Affiliation:

1. Helmholtz Zentrum Dresden‐Rossendorf (HZDR) Helmholtz Institute Freiberg for Resource Technology (HIF) Chemnitzer Str. 40 Freiberg 09599 Germany

2. Helmholtz Zentrum Dresden‐Rossendorf (HZDR) Institute of Ion Beam Physics and Materials Research Bautzner Landstrasse 400 Dresden 01328 Germany

3. Helmholtz Zentrum Potsdam Deutsches GeoForschungsZentrum (GFZ) Telegrafenberg Potsdam14473Germany

Funder

Bundesministerium für Bildung und Forschung

Publisher

Wiley

Subject

Geochemistry and Petrology,Geology,Geochemistry and Petrology,Geology

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1. Super-SIMS at DREAMS: Status of a unique and complex endeavour;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2022-12

2. Ion implantation effects on the characteristics of β-Ga2O3 epilayers grown on sapphire by MOCVD;Ceramics International;2022-12

3. Ni-Au layers on sapphire prepared by direct current magnetron sputtering;Radiation Effects and Defects in Solids;2022-10-20

4. High-Fluence Multi-Energy Ion Irradiation for Testing of Materials;Materials;2022-09-16

5. Atomic spectrometry update – a review of advances in environmental analysis;Journal of Analytical Atomic Spectrometry;2021

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