Assessing conformal thin film growth under nonstochastic deposition conditions: application of a phenomenological model of roughness replication to synthetic topographic images-Reference-Cited by-同舟云学术

Assessing conformal thin film growth under nonstochastic deposition conditions: application of a phenomenological model of roughness replication to synthetic topographic images

Published:2020-08-03 Issue:3 Volume:280 Page:270-279
ISSN:0022-2720
Container-title:Journal of Microscopy
language:en
Short-container-title:Journal of Microscopy

Author:

BONTEMPI M.¹,VISANI A.¹,BENINI M.²,GAMBARDELLA A.¹^ORCID

Affiliation:

1. Laboratorio di Biomeccanica e Innovazione Tecnologica IRCCS Istituto Ortopedico Rizzoli Via di Barbiano 1/10 Bologna 40136 Italy

2. Istituto per lo Studio dei Materiali Nanostrutturati Consiglio Nazionale delle Ricerche Via Gobetti 101 Bologna 40129 Italy

Funder

Istituto Nazionale per l'Assicurazione Contro Gli Infortuni sul Lavoro

Publisher

Wiley

Subject

Histology,Pathology and Forensic Medicine

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1111/jmi.12942

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5. Analysis of microroughness evolution in X‐ray astronomical multilayer mirrors by surface topography with the MPES program and by X‐ray scattering;Canestrari R.;Proceedings Volume 6266, P. Soc. Photo‐Opt. Ins.,2006

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