Preparation of Fluorine-Containing Indium Tin Oxide Sputtering Targets using Spark Plasma Sintering Process-Reference-Cited by-同舟云学术

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Preparation of Fluorine-Containing Indium Tin Oxide Sputtering Targets using Spark Plasma Sintering Process

Published:2008-08 Issue:8 Volume:91 Page:2495-2500
ISSN:0002-7820
Container-title:Journal of the American Ceramic Society
language:en
Short-container-title:

Author:

Takeuchi Tomonari,Kageyama Hiroyuki,Nakazawa Hiromi,Atsumi Toshiyuki,Tamura Shigeharu,Kamijo Nagao,Takeuchi Akihisa,Suzuki Yoshio

Publisher

Wiley

Subject

Materials Chemistry,Ceramics and Composites

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1111/j.1551-2916.2008.02503.x/fullpdf

Reference34 articles.

1. Transparent Conducting Films;Vossen,1977

2. Evaporated Sn-Doped In2O3 Films;Hamberg,1986

3. Properties of Tin Doped Indium Oxide Thin Films Prepared by Magnetron Sputtering;Ray,1983

4. High Conducting Large Area Indium Tin Oxide Electrodes for Displays Prepared by DC Magnetron Sputtering;Latz,1991

5. Influence of Manufacturing Process of Indium Tin Oxide Sputtering Targets on Sputtering Behavior;Gehman,1992

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