Sintering densification behavior of nano-ITO powder with high oxygen vacancy induced via plasma stimulation-Reference-Cited by-同舟云学术

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Sintering densification behavior of nano-ITO powder with high oxygen vacancy induced via plasma stimulation

Published:2024-07 Issue:13 Volume:50 Page:22922-22935
ISSN:0272-8842
Container-title:Ceramics International
language:en
Short-container-title:Ceramics International

Author:

Xing Quan,Huang Taihong^ORCID,Kong Dehao,Wang Tao,Zhai Ruixiong,He Xuan,Yi Jianhong,Song Peng

Funder

Natural Science Foundation of Yunnan Province

Major Science and Technology Projects in Yunnan Province

Publisher

Elsevier BV

Reference32 articles.

1. The sintering behavior, microstructure, and electrical properties of gallium-doped zinc oxide ceramic targets;Wu;J. Eur. Ceram. Soc.,2014

2. Dispersion and microwave processing of nano-sized ITO powder for the fabrication of transparent conductive oxides;Ghanizadeh;Ceram. Int.,2016

3. Effect of the duty ratio on the indium tin oxide (ITO) film deposited by in-line pulsed DC magnetron sputtering method for resistive touch panel;Ahn;Appl. Surf. Sci.,2011

4. Optoelectronic properties of p-type NiO films deposited by direct current magnetron sputtering versus high power impulse magnetron sputtering;Chen;Appl. Surf. Sci.,2020

5. ITO films with different preferred orientations prepared by DC magnetron sputtering;Wang;Opt. Mater.,2022

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