Fabrication of highly homogeneous Al-doped TiO2 nanotubes by nanolamination of atomic layer deposition-Reference-Cited by-同舟云学术

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Fabrication of highly homogeneous Al-doped TiO2 nanotubes by nanolamination of atomic layer deposition

Published:2017-07-31 Issue:11 Volume:100 Page:4988-4993
ISSN:0002-7820
Container-title:Journal of the American Ceramic Society
language:en
Short-container-title:J Am Ceram Soc

Author:

Su Chung-Yi¹^ORCID,Wang Chih-Chieh²,Hsueh Yang-Chih¹,Gurylev Vitaly¹,Kei Chi-Chung³,Perng Tsong-Pyng¹

Affiliation:

1. Department of Materials Science and Engineering; National Tsing Hua University; Hsinchu Taiwan

2. Department of Materials Science and Engineering; Feng Chia University; Taichung Taiwan

3. Instrument Technology Research Center; National Applied Research Laboratories; Hsinchu Taiwan

Funder

Ministry of Science and Technology, Taiwan

Publisher

Wiley

Subject

Materials Chemistry,Ceramics and Composites

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1111/jace.15044/fullpdf

Reference26 articles.

1. Interface effect on dielectric constant of HfO2/Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition;Park;Appl Phys Lett,2007

2. Giant dielectric constant in TiO2/Al2O3 nanolaminates grown on doped silicon substrate by pulsed laser deposition;Walke;J Appl Phys,2014

3. Structure analysis of Al-modified TiO2 nanocatalyst supports;Olsen;J Phys Chem C,2014

4. Pulsed plasma-enhanced chemical vapor deposition of Al2O3-TiO2 nanolaminates;Rowlette;Thin Solid Films,2010

5. Study on structural, mechanical and optical properties of Al2O3-TiO2 nanolaminates prepared by atomic layer deposition;Iatsunskyi;J Phys Chem C,2015

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