Characterization of the Polishing-Induced Contamination of Fused Silica Optics

Author:

Pfiffer Mathilde1,Longuet Jean-Louis2,Labrugère Christine3,Fargin Evelyne4,Bousquet Bruno5,Dussauze Marc6,Lambert Sébastien2,Cormont Philippe1,Néauport Jérôme1

Affiliation:

1. Commissariat à l'Energie Atomique et aux Energies Alternatives; Centre d'Etudes Scientifiques et Techniques d'Aquitaine; BP2 33114 Le Barp France

2. Commissariat à l'Energie Atomique et aux Energies Alternatives, Le Ripault; BP16 37260 Monts France

3. Plateforme Aquitaine de Caractérisation des Matériaux, UMS3626; 33608 Pessac France

4. Institut de Chimie de la Matière Condensée de Bordeaux; 33608 Pessac France

5. Centre d'Etudes des Laser Intenses et Applications; UMR 5107 CNRS; Université de Bordeaux, CEA; 33405 Talence France

6. Institut des Sciences Moléculaires; UMR 5255 CNRS; 33405 Talence France

Funder

Agence Nationale de la Recherche

Publisher

Wiley

Subject

Materials Chemistry,Ceramics and Composites

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1. Ultra-precision optical processing technology for large-aperture laser optics: Polishing path and technical parameter of arrayed magnetorheological finishing (AMRF);Optics & Laser Technology;2024-03

2. Effect of different grinding strategies on subsequent polishing processes of sapphire;Journal of Manufacturing Processes;2024-02

3. Laser damage properties of LiB3O5 crystal surface under UV laser irradiation;Optics Express;2023-08-29

4. LIBS Analysis of Optical Surfaces and Thin Films;Laser Induced Breakdown Spectroscopy (LIBS);2023-03-17

5. Design and analysis of multi-axis optical compound machine tool;Advanced Optical Manufacturing Technologies and Applications 2022; and 2nd International Forum of Young Scientists on Advanced Optical Manufacturing (AOMTA and YSAOM 2022);2023-01-09

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