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3. Ionic transport in amorphous oxides;Doremus;J. Electrochem. Soc.,1968
4. Sodium redistribution in thermal oxide on silicon by radiochemical and MOS analysis;Yon;I.E.E.E. Trans. Electron Devices,1966
5. Phosphosilicate glass stabilization of FET devices;Balk;Proc. I.E.E.E.,1969