Etching behavior of ground fused silica and light enhancement modulated by surface/subsurface cracks
Author:
Affiliation:
1. School of Mechanical Engineering University of Shanghai for Science and Technology Shanghai China
Publisher
Wiley
Subject
General Materials Science
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1111/ijag.16563
Reference28 articles.
1. Ground fused silica processed by combined chemical etching and CO2 laser polishing with super-smooth surface and high damage resistance
2. Laser induced damage characteristics of fused silica optics treated by wet chemical processes
3. Investigation of subsurface damage density and morphology impact on the laser-induced damage threshold of fused silica
4. Resistance of Scratched Fused Silica Surface to UV Laser Induced Damage
5. Understanding the effect of wet etching on damage resistance of surface scratches
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2. The decisive effects of the stress states and brittle-plasticity of the surface defects on their laser-induced damage thresholds on fused silica surfaces;Ceramics International;2024-01
3. Light-field-enhanced laser damage model for polishing-produced particles in fused silica optical surface;Optics & Laser Technology;2024-01
4. Surface evolution of fused silica hemispherical resonators and its influence on the quality factor;Sensors and Actuators A: Physical;2023-09
5. Subsurface damage model in single and double scratching of fused silica with a blunt indenter;International Journal of Mechanical Sciences;2023-07
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