Nanoplastic removal function and the mechanical nature of colloidal silica slurry polishing-Reference-Cited by-同舟云学术

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Nanoplastic removal function and the mechanical nature of colloidal silica slurry polishing

Published:2018-11-15 Issue:6 Volume:102 Page:3141-3151
ISSN:0002-7820
Container-title:Journal of the American Ceramic Society
language:en
Short-container-title:J Am Ceram Soc

Author:

Shen Nan¹^ORCID,Feigenbaum Eyal¹,Suratwala Tayyab¹^ORCID,Steele William¹,Wong Lana¹,Feit Michael D.¹,Miller Phil E.¹

Affiliation:

1. Lawrence Livermore National Laboratory Livermore California

Funder

Lawrence Livermore National Laboratory

U.S. Department of Energy

Publisher

Wiley

Subject

Materials Chemistry,Ceramics and Composites

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1111/jace.16161

Reference29 articles.

1. Convergent Pad Polishing of Amorphous Silica

2. Toward Deterministic Material Removal and Surface Figure During Fused Silica Pad Polishing

3. Microscopic Removal Function and the Relationship Between Slurry Particle Size Distribution and Workpiece Roughness During Pad Polishing

4. Influence of Temperature and Material Deposit on Material Removal Uniformity during Optical Pad Polishing

5. The structure of abraded glass surfaces

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Improving monocrystalline silicon surface quality with chemical mechanical polishing using the slurry with the additive of isopropanol;Colloids and Surfaces A: Physicochemical and Engineering Aspects;2024-06

2. Formation and changing principle of the dynamic shape of the pitch polishing lap under the loading conditioner in continuous polishing;2024-04-17

3. Fixed Abrasive Polishing in an Anhydrous Environment: A Material Removal Model for Fused Silica;Machines;2022-02-17

4. Subsurface mechanical damage correlations after grinding of various optical materials;Optical Engineering;2019-04-25

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