Short-Duration Rapid-Thermal-Annealing Processing of Tantalum Oxide Thin Films

Author:

Ezhilvalavan Santhiagu,Tseng Tseung-Yuen

Publisher

Wiley

Subject

Materials Chemistry,Ceramics and Composites

Reference33 articles.

1. M. Saitoh T. Mori H. Tamura Electrical Properties of Thin Ta 2 O 5 Films Grown by Chemical Vapor Deposition Tech. Dig.-Int. Electron Devices Mater 680 83 1996

2. Tantalum Oxide Thin Films for Dielectric Applications by Low Pressure Chemical Vapor Deposition;Hitchens;J. Electrochem. Soc.,1993

3. Y. Numasawa S. Kamiyama M. Zenke M. Sakamoto Ta 2 O 5 Plasma CVD Technology for DRAM Stacked Capacitors Tech. Dig.-Int. Electron Devices Mater 43 48 1989

4. Preparation and Properties of Ta2O5 Films by LPCVD for ULSI Application;Zaima;J. Electrochem. Soc.,1990

5. CVD of Ta2O5 Films for Monolithic Capacitor Applications;Kaplan;J. Electrochem. Soc.,1976

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