The SiO2-SI3N4 Interface, Part II: O2 Permeation and Oxidation Reaction
Author:
Publisher
Wiley
Subject
Materials Chemistry,Ceramics and Composites
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1111/j.1151-2916.1995.tb08482.x/fullpdf
Reference37 articles.
1. Oxidation Studies of Crystalline CVD Silicon Nitride;Du;J. Electrochem. Soc.,1989
2. TEM Evidence for Oxynitride Layer in the Oxidation of SiN4;Ogbuji;J. Electrochem. Soc.,1991
3. Role of Si2N2O in the Passive Oxidation of ChemicallyVapor-Deposited Si3N4;Ogbuji;J. Am. Ceram. Soc.,1992
4. A Mixed-Interface Reaction/Diffusion-Controlled Model for Oxidation of Si3N4;Luthra;J. Electrochem. Soc.,1991
5. Corrosion of Silicon-based Ceramics in Combustion Environments;Jacobson;J. Am. Ceram. Soc.,1993
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