Extremely Thin Al2 O3 Surface-Passivated Nanocrystalline ZnO Thin-Film Transistors Designed for Low Process Temperature-Reference-Cited by-同舟云学术

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Extremely Thin Al2 O3 Surface-Passivated Nanocrystalline ZnO Thin-Film Transistors Designed for Low Process Temperature

Published:2016-01-25 Issue:4 Volume:99 Page:1305-1310
ISSN:0002-7820
Container-title:Journal of the American Ceramic Society
language:en
Short-container-title:J. Am. Ceram. Soc.

Author:

Ahn Cheol Hyoun¹,Kim So Hee¹,Kim Yong-Hoon¹,Cho Hyung Koun¹

Affiliation:

1. School of Advanced Materials Science and Engineering; Sungkyunkwan University; 2066 Seobu-ro Jangan-gu, Suwon Gyeonggi-do 440-746 Korea

Funder

National Research Foundation of Korea

Basic Research Laboratory project of the Korea government

Ministry of Science, ICT and Future Planning

Publisher

Wiley

Subject

Materials Chemistry,Ceramics and Composites

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1111/jace.14053/fullpdf

Reference29 articles.

1. Repeated Temperature Modulation Epitaxy for P-Type Doping and Light-Emitting Diode Based on ZnO;Tsukazaki;Nature Mater,2005

2. Zinc Oxide Nanostructures: Growth, Properties and Applications;Wang;J. Phys.: Condens. Matter,2004

3. UV-Activated Room-Temperature Gas Sensing Mechanism of Polycrystalline ZnO;Fan;Appl. Phys. Lett.,2009

4. ZnO-Based Transparent Thin-Film Transistors;Hoffman;Appl. Phys. Lett.,2003

5. Room-Temperature Fabrication of Transparent Flexible Thin-Film Transistors Using Amorphous Oxide Semiconductors;Nomura;Nature,2004

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Rapid thermal annealing effect of transparent ITO source and drain electrode for transparent thin film transistors;Ceramics International;2021-02

2. Self-Assembled Monolayers (SAMs)/Al2O3 Double Layer Passivated InSnZnO Thin-Film Transistor;IEEE Access;2020

3. Highly Improved Quasi-Two-Dimensional Oxide Transistors via Non-centrosymmetric Nitrogen Dioxide Treatment, toward Extremely Low Process Temperature and Operant Self-Aligned Coplanar Structure;ACS Applied Materials & Interfaces;2019-07-15

4. Review Article: Atomic layer deposition for oxide semiconductor thin film transistors: Advances in research and development;Journal of Vacuum Science & Technology A;2018-11

5. Room-Temperature Processing of Printed Oxide FETs Using Ultraviolet Photonic Curing;Advanced Electronic Materials;2017-07-12

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