Plasma etching behavior of yttrium‐aluminum oxide composite ceramics
Author:
Affiliation:
1. School of Electromechanical Engineering Guangdong University of Technology Guangzhou Guangdong China
2. Suntech Advanced Ceramic of Shenzhen co., Ltd Shenzhen Guangdong China
Publisher
Wiley
Subject
Materials Chemistry,Marketing,Condensed Matter Physics,Ceramics and Composites
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1111/ijac.13712
Reference24 articles.
1. Fluorination mechanisms of Al2O3 and Y2O3 surfaces irradiated by high-density CF4∕O2 and SF6∕O2 plasmas
2. Relative sputtering rates of oxides and fluorides of aluminum and yttrium
3. Characteristics of yttrium fluoride and yttrium oxide coatings for plasma process equipment prepared by atmospheric plasma spraying
4. The erosion behaviors of Y2O3 and YF3 coatings under fluorocarbon plasma
5. Preparation and Characterization of Sprayed-Yttrium Oxyfluoride Corrosion Protective Coating for Plasma Process Chambers
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