Stiction Recovery of Silicon Oxide Cantilevers with Pulse Laser Irradiation for MEMS

Author:

Nakata Masashi1,Fushinobu Kazuyoshi1,Okazaki Ken1

Affiliation:

1. Tokyo Institute of Technology

Publisher

Institute of Electrical Engineers of Japan (IEE Japan)

Subject

Electrical and Electronic Engineering,Mechanical Engineering

Reference5 articles.

1. (1) H. Guckel, J.J. Sniegowski & T.R. Christenson: “Fabrication of Micromechanical Devices from Polysilicon Films with Smooth Surfaces”, Sensors and Actuators, 20, pp. 117-122 (1989)

2. (2) Ijaz Jafri, Heinz Busta & Steven Walsh: “Critical Point Drying and Cleaning for MEMS Technology”, Proceedings of SPIE, the international Society for Optical Engineering, 3880, pp. 51-58 (1999)

3. (3) Uthara Srinivasan, Micheal R. Houston, Roger T. Howe & Roya Maboudian: “Self-Assembled Fluorocarbon Films for Enhanced Stiction Reduction”, TRANSDUCERS ’97, 1997 International Conference on Solid-State Sensors and Actuators, pp. 1399-1402 (1997)

4. (4) N.C. Tien, S. Jeong, L.M. Phinney, K. Fushinobu and J. Boker: “Surface adhesion reduction in silicon microstructures using femtosecond laser pulses”, Applied Physics Letters, 68 (2), pp. 197-199 (1996)

5. (7) H.R. Philipp: “Optical Properties or Non-Crystalline Si, SiO, SiOx and SiO2”, Journal of Physics and Chemistry of Solids, 32, pp. 1935-1945 (1971)

Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Stiction Recovery of Silicon Oxide Cantilevers with Heating Elements for MEMS;IEEJ Transactions on Sensors and Micromachines;2004

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