Development Trend of Three-Dimensional (3D) Integration Technology

Author:

Sakuma Katsuyuki1

Affiliation:

1. IBM Research - Tokyo

Publisher

Institute of Electrical Engineers of Japan (IEE Japan)

Subject

Electrical and Electronic Engineering,Mechanical Engineering

Reference33 articles.

1. (1) S. Sun : “Process technologies for advanced metallization and interconnect systems”, in IEEE Int. Electronic Devices Meeting, pp. 765-768 (Dec. 1997)

2. (2) T. C. Chen : “Where Si-CMOS Is Going: Trendy Hype vs Real Technology”, International Solid State Circuits Conference (ISSCC), San Francisco, CA (2006)

3. (3) W. Haensch : “Why Should We Do 3D Integration”, Design Automation Conference (DAC), pp. 674-675 (2008)

4. (4) P. Brofman : “IBM's packaging Technology Roadmap and the “Collaboratory” approach to Advanced Packaging Development”, International Conference on Electronics Packaging (ICEP), pp. 1-6 (2009)

5. Future system-on-silicon LSI chips

Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Reliability-Aware Heterogeneous 3D Chip Multiprocessor Design;Journal of Electronic Testing;2013-04

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