Area-selective Cu Film Growth on TiN and SiO<sub>2</sub> by Supercritical Fluid Deposition-Reference-Cited by-同舟云学术

Area-selective Cu Film Growth on TiN and SiO₂ by Supercritical Fluid Deposition

Published:2020-01-01 Issue:1 Volume:140 Page:31-36
ISSN:1341-8939
Container-title:IEEJ Transactions on Sensors and Micromachines
language:en
Short-container-title:IEEJ Trans. SM

Author:

Usami Naoto¹,Ota Etsuko²,Higo Akio²,Momose Takeshi³,Mita Yoshio¹

Affiliation:

1. Department of Electrical Engineering and Information Systems (EEIS), The University of Tokyo

2. VLSI Design and Education Center (VDEC), The University of Tokyo

3. Department of Materials Engineering, The University of Tokyo

Publisher

Institute of Electrical Engineers of Japan (IEE Japan)

Subject

Electrical and Electronic Engineering,Mechanical Engineering

Link

https://www.jstage.jst.go.jp/article/ieejsmas/140/1/140_31/_pdf

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