Development of Self-heated Stage Suitable for Thermal Assist Reactive Ion Etching of the Functional Metals-Reference-Cited by-同舟云学术

Development of Self-heated Stage Suitable for Thermal Assist Reactive Ion Etching of the Functional Metals

Published:2017 Issue:9 Volume:137 Page:262-266
ISSN:1341-8939
Container-title:IEEJ Transactions on Sensors and Micromachines
language:en
Short-container-title:IEEJ Trans. SM

Author:

Murata Yuki¹,Han Gang¹,Ohkawa Daiki¹,Imai Junichi¹,Sohgawa Masayuki¹,Abe Takashi¹

Affiliation:

1. Graduate School of Sience and Technology, Niigata University

Publisher

Institute of Electrical Engineers of Japan (IEE Japan)

Subject

Electrical and Electronic Engineering,Mechanical Engineering

Link

https://www.jstage.jst.go.jp/article/ieejsmas/137/9/137_262/_pdf

Reference9 articles.

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2. (2) D. Ha, H. Takeuchi, Y. K. Choi, and T. J. King : “Molybdenum Gate Technology for Ultrathin-Body MOSFETs and FinFETs”, IEEE TED, Vol. 51, pp. 1989-1996 (2004)

3. (3) E. R. Parker, M. P. Rao, K. L. Turner, C. D. Meinhart, and N. C. MacDonald : Journal of microelectromechanical systems, Vol. 16, No. 2 (2007)

4. (4) C. M. J. M. Pypen, H. Plenk Jr, M. F. Ebel, R. Svagera, and J. Wernisch : “ Characterization of microblasted and reactive ion etched surfaces on the commercially pure metals niobium, tantalum and titanium”, Journal of Materials Science: Materials in Medicine 8 (1997) 781 Ð 784

5. (5) S. Yamada, Y. Minami, M. Sohgawa, and T. Abe : “Thermal reactive ion etching technique involving use of self-heated cathode”, Rev. Sci. Intruments, Vol. 86, No. 4 (2015)

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