Affiliation:
1. The University of Tokyo
2. Nikon Corporation
Publisher
Institute of Electrical Engineers of Japan (IEE Japan)
Subject
Electrical and Electronic Engineering,Industrial and Manufacturing Engineering,Mechanical Engineering,Energy Engineering and Power Technology,Automotive Engineering
Reference13 articles.
1. (1) T. Oomen, R. van Herpen, S. Quist, M. van de Wal, O. Bosgra, and M. Steinbuch: “Connecting System Identification and Robust Control for Next-Generation Motion Control of a Wafer Stage”, IEEE Trans. on Control Systems Technology, Vol. 22, pp. 102-118 (2014)
2. (2) S. Ozawa: “The Current Lithography Technologies of the LCD Exposure System”, IEICE Trans. C, Vol. J84-C, No. 12, pp. 1227-1231 (2001) (in Japanese)
3. (3) P. Yang, B. Alamo, and G. Andeen: “Control design for a 6 DOF e-beam lithography stage”, in American Control Conference, Vol. 3, pp. 2255-2260 (2001)
4. (4) H. Butler: “Position Control in Lithographic Equipment”, IEEE Control Systems Magazine, Vol. 31, No. 5, pp. 28-47 (2011)
5. (5) Y. Choi and D. Gweon: “A high-precision dual-servo stage using halbach linear active magnetic bearings”, IEEE/ASME Transactions on Mechatronics, Vol. 16, No. 5, pp. 925-931 (2011)
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