Etching Characteristics of Fabricated Grooves on Silicon Solar Cell using Surface Discharge Plasma-Reference-Cited by-同舟云学术

Etching Characteristics of Fabricated Grooves on Silicon Solar Cell using Surface Discharge Plasma

Published:2010 Issue:11 Volume:130 Page:999-1003
ISSN:0385-4205
Container-title:IEEJ Transactions on Fundamentals and Materials
language:en
Short-container-title:IEEJ Trans. FM

Author:

Hamada Toshiyuki¹,Sakoda Tatsuya²

Affiliation:

1. Department of Materials and Informatics, Interdisciplinary Graduate School of Agriculture and Engineering, University of Miyazaki

2. Department of Electrical and Electronic Engineerign, Interdisciplinary Graduate School of Agriculture and Engineering, University of Miyazaki

Publisher

Institute of Electrical Engineers of Japan (IEE Japan)

Subject

Electrical and Electronic Engineering

Link

http://www.jstage.jst.go.jp/article/ieejfms/130/11/130_11_999/_pdf

Reference7 articles.

1. (1) S. Wenham : “Buried-contact silicon solar cells”, Progress in Photovoltics, Vol. 1, No. 1, pp. 3-10 (1992)

2. (2) J. Horzel, J. Szlufcik, J. Nijs, and R. Mertens : “A Simple Processing Sequence for Selective Emitter”, Proc. of 26^th IEEE PVSC, pp. 139-142 (1997)

3. Selective Etching of Silicon Nitride Film on Single Crystalline Silicon Solar Cell Using Intensive Surface Discharge

4. Optimization of convex electrode geometry for surface discharge used for fabrication of the electrode groove on solar cells

5. Fabrication of Electrode Groove on Silicon Solar Cell using High-Pressure Surface Discharge

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