Micromachining of Silica Glass Using EUV Radiation of Laser-Produced Plasma-Reference-Cited by-同舟云学术

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Micromachining of Silica Glass Using EUV Radiation of Laser-Produced Plasma

Published:2010 Issue:10 Volume:130 Page:1779-1783
ISSN:0385-4221
Container-title:IEEJ Transactions on Electronics, Information and Systems
language:en
Short-container-title:IEEJ Trans.EIS

Author:

Takahashi Akihiko¹,Torii Shuichi²,Makimura Tetsuya²,Murakami Kouichi²,Okazaki Kota¹,Nakamura Daisuke³,Okada Tatsuo³,Niino Hiroyuki⁴

Affiliation:

1. Department of Health Sciences, School of Medicine, Kyushu University

2. Institute of Applied Physics, University of Tsukuba

3. Graduate School of Information Sciences and Electrical Engineering, Kyushu University

4. Photonic Research Institute, National Institute of Advanced Industrial Science and Technology

Publisher

Institute of Electrical Engineers of Japan (IEE Japan)

Subject

Electrical and Electronic Engineering

Link

http://www.jstage.jst.go.jp/article/ieejeiss/130/10/130_10_1779/_pdf

Reference19 articles.

1. (1) K. Sugioka, S. Wada, Y. Ohmura, H. Tashiro, and K. Toyoda : “Multiwavelength irradiation effect in fused quartz ablation using vacuum-ultraviolet Raman laser”, Appl. Surf. Sci., Vol. 96-98, pp. 347-351 (1996)

2. Direct fabrication of microgratings in fused quartz by laser-induced plasma-assisted ablation with a KrF excimer laser

3. (3) J. Wang, H, Niino, and A. Yabe : “Micromachining of quartz crystal with excimer lasers by laser-induced backside wet etching”, Appl. Phys. A, Vol. 69, pp. S271-S273 (1999)

4. Synchrotron radiation‐excited etching of SiO2with SF6at 143 and 251 Å using undulator radiation

5. Photostimulated evaporation of SiO2films by synchrotron radiation

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