Development and Recent Progress on Diamond Semiconductor Devices
Author:
Affiliation:
1. National Institute of Advanced Industrial Science and Technology (AIST)
Publisher
Institute of Electrical Engineers of Japan (IEE Japan)
Link
https://www.jstage.jst.go.jp/article/ieejeiss/144/3/144_193/_pdf
Reference32 articles.
1. (1) S. Koizumi, et al.: “Growth and characterization of phosphorous doped {111} homoepitaxial diamond thin films”, Appl. Phys. Lett., Vol. 71, pp. 1065-1067 (1997)
2. (2) S. Koizumi, et al.: “Ultraviolet Emission from a Diamond pn Junction”, SCIENCE, Vol. 292, pp. 1899-1901 (2001)
3. (3) K. Ikeda, et al.: “Thermally Stable Schottky Barrier Diode by Ru/Diamond”, Appl. Phys. Express, Vol. 2, pp. 011202-1-3 (2009)
4. (4) H. Umezawa, et al.: “1 Ω On-Resistance Diamond Vertical-Schottky Barrier Diode Operated at 250°C”, Appl. Phys. Express, Vol. 6, pp. 011302-1-4 (2013)
5. (5) T. Teraji, et al.: “Low-leakage p -type diamond Schottky diodes prepared using vacuum ultraviolet light/ozone treatment”, J. Appl. Phys., Vol. 105, pp. 126109-1-3 (2009)
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