A Method for Calculating the Index of Refraction of Thin Films

Abstract

A new method for determining the index of refraction from normal incidence reflection and transmission measurements has been developed. Several other methods are reviewed to explain why a new method is needed. The author's method used a thickness variational approach. For an accurate determination of n and k, the method requires normal incidence reflection and transmission measurements over a fairly broad spectral range for at least two different film thicknesses. These requirements are unavoidable for normal incidence methods.