Numerical Modeling of Floating Electrodes in a Plasma Processing System-Reference-Cited by-同舟云学术

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Numerical Modeling of Floating Electrodes in a Plasma Processing System

Published:2015-07-30 Issue:4 Volume:24 Page:102-110
ISSN:2288-6559
Container-title:Applied Science and Convergence Technology
language:en
Short-container-title:Applied Science and Convergence Technology

Author:

Joo Junghoon

Publisher

The Korean Vacuum Society

Subject

Electrical and Electronic Engineering,Physical and Theoretical Chemistry,Condensed Matter Physics,Materials Science (miscellaneous)

Link

http://ocean.kisti.re.kr/downfile/crosscheck/kvs/JAKO201523051805183.pdf

Reference8 articles.

1. A numerical study of the effect of gas injection position in an inductively coupled plasma discharge

2. Numerical Modeling of Plasma Characteristics of ICP System with a Pulsed dc Bias

3. Numerical Modeling of Very High Frequency Multi Hollow Cathode PECVD

4. Numerical Modeling of a Rectangular Type Inductively Coupled Plasma System

5. Sheath structure and ion current onto a patterned surface immersed in a plasma at floating potential

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Simulation of Cold Atmospheric Plasma Generated by Floating-Electrode Dielectric Barrier Pulsed Discharge Used for the Cancer Cell Necrosis;Coatings;2021-11-19

2. Development of a Plasma Training Lab kart: System Setup and Numerical Simulation;Applied Science and Convergence Technology;2017-11-30

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