Improved Antireflection Property of Si by Au Nanoparticle-Assisted Electrochemical Etching-Reference-Cited by-同舟云学术

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Improved Antireflection Property of Si by Au Nanoparticle-Assisted Electrochemical Etching

Published:2012-03-30 Issue:2 Volume:21 Page:99-105
ISSN:1225-8822
Container-title:Journal of the Korean Vacuum Society
language:en
Short-container-title:Journal of the Korean Vacuum Society

Author:

Ko Yeong-Hwan,Joo Dong-Hyuk,Yu Jae-Su

Publisher

The Korean Vacuum Society

Subject

Electrical and Electronic Engineering,Physical and Theoretical Chemistry,Condensed Matter Physics,Materials Science (miscellaneous)

Link

http://ocean.kisti.re.kr/downfile/crosscheck/kvs/JAKO201211666470504.pdf

Reference18 articles.

1. Anti-Reflection Coating Application of SixOy-SixNyStacked-Layer Fabricated by Reactive Sputtering

2. Design of multilayer antireflection coatings made from co-sputtered and low-refractive-index materials by genetic algorithm

3. Antireflection gratings for a photonic-crystal flat lens

4. Optimal design for antireflective tapered two-dimensional subwavelength grating structures

5. Light trapping effect of submicron surface textures in crystalline Si solar cells

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Reduction of Light Reflectance from InAlP by the Texture Formation Using Ultra-Thin Pt Layer;Journal of the Korean Vacuum Society;2013-05-30

2. Influence of Carrier Trap in InAs/GaAs Quantum-Dot Solar Cells;Journal of the Korean Vacuum Society;2013-01-30

3. Properties of Indium Tin Oxide Thin Films According to Oxygen Flow Rates by γ-FIB System;Journal of the Korean Vacuum Society;2012-11-30

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