Detection and characterization of carbon contamination on EUV multilayer mirrors-Reference-Cited by-同舟云学术

Detection and characterization of carbon contamination on EUV multilayer mirrors

Published:2009-09-09 Issue:19 Volume:17 Page:16969
ISSN:1094-4087
Container-title:Optics Express
language:en
Short-container-title:Opt. Express

Author:

Chen Juequan,Louis Eric,Lee Chris J.,Wormeester Herbert,Kunze Reinhard,Schmidt Hagen,Schneider Dieter,Moors Roel,van Schaik Willem,Lubomska Monika,Bijkerk Fred

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference29 articles.

1. Progress in Mo/Si multilayer coating technology for EUVL optics

2. Modeling radiation-induced carbon contamination of extreme ultraviolet optics

3. Investigation of carbon contamination of mirror surfaces exposed to synchrotron radiation

4. IMD—Software for modeling the optical properties of multilayer films

5. Carbon deposition on multi-layer mirrors by extreme ultra violet ray irradiation

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