Development of a narrowband multilayer mirror for extracting a single order component from high harmonics in the 63–70  eV region

Author:

Yi Liu Suet1ORCID,Iwamoto Yuya1ORCID,Mashiko Hiroki2ORCID,Ichimaru Satoshi2,Hatayama Masatoshi2,Gullikson Eric M.3,Mizuno Tomoya4ORCID,Kurihara Takayuki4ORCID,Itatani Jiro4ORCID,Takenaka Hisataka1ORCID

Affiliation:

1. TOYAMA Co., Ltd.

2. NTT Advanced Technology Corporation

3. Lawrence Berkeley National Laboratory

4. Institute for Solid State Physics, The University of Tokyo

Abstract

The Y/AlSi multilayer with narrowband performance was developed for extracting a single order component from high harmonics. We compared the performance and thermal stability of Y/AlSi with another EUV mirror, Zr/AlSi multilayer, which has shown promising performance in the EUV region. At near-normal incidence, the measured peak reflectances of Y/AlSi and Zr/AlSi multilayers are 43% and 52% at ∼63.8eV, and the energy bandwidths (FWHM) are 1.7 eV and 2.5 eV, respectively. The narrower bandwidth feature obtained in the Y/AlSi multilayer allows better suppression on adjacent high harmonic lines. After heating up to 200°C, there is no significant decrease in the reflectance of either multilayer. No decrease in reflectivity was observed after storage in air for one year.

Funder

Japan Science and Technology Agency

Publisher

Optica Publishing Group

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