Electro-optical system for scanning microscopy of extreme ultraviolet masks with a high harmonic generation source-Reference-Cited by-同舟云学术

Electro-optical system for scanning microscopy of extreme ultraviolet masks with a high harmonic generation source

Published:2014-08-12 Issue:17 Volume:22 Page:20144
ISSN:1094-4087
Container-title:Optics Express
language:en
Short-container-title:Opt. Express

Author:

Naulleau Patrick P.,Anderson Christopher N.,Anderson Erik H.,Andreson Nord,Chao Weilun,Choi Changhoon,Goldberg Kenneth A.,Gullikson Eric M.,Kim Seong-Sue,Lee Donggun,Miyakawa Ryan,Park Jongju,Rekawa Seno,Salmassi Farhad

Funder

Samsung

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference19 articles.

1. At-wavelength detection of extreme ultraviolet lithography mask blank defects

2. A dual-mode actinic EUV mask inspection tool

3. At-wavelength extreme ultraviolet lithography mask inspection using a Mirau interferometric microscope

4. Mask defect inspection using an extreme ultraviolet microscope

5. Performance of actinic EUVL mask imaging using a zoneplate microscope

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