Computer-generated holograms fabricated by direct write of positive electron-beam resist-Reference-Cited by-同舟云学术

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Computer-generated holograms fabricated by direct write of positive electron-beam resist

Published:1993-02-15 Issue:4 Volume:18 Page:308
ISSN:0146-9592
Container-title:Optics Letters
language:en
Short-container-title:Opt. Lett.

Author:

Urquhart Kristopher S.,Stein Robert,Lee Sing H.

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference9 articles.

1. Blazed gratings and Fresnel lenses fabricated by electron-beam lithography

2. Rectangular-apertured micro-Fresnel lens arrays fabricated by electron-beam lithography

3. Blazed reflection micro-Fresnel lenses fabricated by electron-beam writing and dry development

4. Multilevel phase holograms manufactured by electron-beam lithography

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1. Computer generated hologram-ROM fabrication and duplication by EBL and UV-NIL;Microelectronic Engineering;2014-07

2. Three-dimensional patterning and morphological control of porous nanomaterials by gray-scale direct imprinting;Scientific Reports;2013-03-21

3. Low cost production of computer-generated holograms: from design to optical evaluation;Journal of the European Optical Society: Rapid Publications;2010-04-06

4. Antireflective characteristics of hemispherical grid grating;Chinese Science Bulletin;2005

5. Vector coupled-wave analysis of hemispherical grid gratings for visible light;Journal of Optics A: Pure and Applied Optics;2004-03-12

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