Nonlinear dwell-time algorithm for freeform surface generation by atmospheric-pressure plasma processing

Abstract

Based on deterministic chemical etching, atmospheric pressure plasma processing (APPP) with a high material removal rate and spatial machining resolution, is a promising computer-controlled optical surfacing (CCOS) technique for freeform surface generation. However, the time-variant removal characteristics of APPP induce nonlinearity in the CCOS process, which requires more consideration in the dwell-time calculation. In this paper, the nonlinear dwell-time algorithm based on the concept of controlling volumetric removal is studied. The freeform surface generation by controlling volumetric removal is modeled to provide the theoretical basis for the algorithm. The applicability of the algorithm in freeform generation by APPP with time-varying characteristics is explored through numerical simulations. Finally, a freeform surface is successfully created based on the algorithm and relevant analysis results, which validates the applicability of the algorithm in freeform generation using time-variant tool influence functions.